Retrofit CDSEM S-9380 执行原厂新机器同样验收技术指标：

提供样品测试验证；

General

Wafer size : 8-inch(200-mmsize)

V-notch wafer of SEMI or JEIDA standards is applicable.

CD measurement principle: Cursor and line profile measurement

CD measurement range: 0.05 to 2.0mm (either line width or hole diameter)

CD measurement reproducibility: ±1% or 0.6 nm (3 sigma), whichever larger

Throughput : due to the data after modification from HitachiHigh-Technologies Corporation

Secondary electron image resolution

: 2 nm (at accelerating voltage of 0.8 kV; with

Hitachi’s reference specimen for resolutionmeasurement)

Magnification : SEM image - 1,000´to 300,000´

Optical microscope image - approximately 110x (220x isoptional)

升级：实验室数据上传接口；